SLA (Stereolithography) mangrupa prosés manufaktur aditif anu jalan ku fokus hiji laser UV kana tong tina résin photopolymer. Kalayan bantuan komputer manufaktur dibantuan atawa komputer dibantuan desain (CAM / CAD) software, anu laser UV dipaké pikeun ngagambar desain pre-diprogram atawa bentuk dina beungeut potopolymer tong. Photopolymers anu sénsitip kana sinar ultraviolét, jadi résin ieu photochemically solidified sarta ngabentuk lapisan tunggal objék 3D dipikahoyong. Prosés ieu diulang pikeun tiap lapisan desain nepi ka objék 3D réngsé.
CARMANHAAS tiasa nawiskeun pelanggan sistem optik utamina kalebet Panyeken Galvanometer gancang sareng lensa scan F-THETA, Beam expander, Eunteung, jsb.
355nm Galvo Scanner Kepala
Modél | PSH14-H | PSH20-H | PSH30-H |
Cai tiis / disegel sirah scan | enya | enya | enya |
Aperture (mm) | 14 | 20 | 30 |
Éféktif Scan Angle | ± 10° | ± 10° | ± 10° |
Kasalahan nyukcruk | 0.19 mnt | 0,28 ms | 0.45ms |
Waktu Tanggapan Lengkah (1% tina skala pinuh) | ≤ 0,4 mdet | ≤ 0,6 mdet | ≤ 0,9 ms |
Laju has | |||
Positioning / luncat | < 15 m/s | < 12 m/s | <9 m/s |
Panyeken garis / scanning raster | < 10 m/s | <7 m/s | < 4 m/s |
Panyeken vektor biasa | < 4 m/s | < 3 m/s | < 2 m/s |
Kualitas Tulisan anu saé | 700 cps | 450 cp | 260 cps |
Kualitas tulisan anu luhur | 550 cp | 320 cp | 180 cps |
Precision | |||
Linearitas | 99,9% | 99,9% | 99,9% |
Resolusi | ≤ 1 urad | ≤ 1 urad | ≤ 1 urad |
Pangulangan | ≤ 2 urad | ≤ 2 urad | ≤ 2 urad |
Suhu Drift | |||
Offset Drift | ≤ 3 urad/℃ | ≤ 3 urad/℃ | ≤ 3 urad/℃ |
Qver 8jam Jangka Panjang Offset Drift (Saatos 15 mnt waspada) | ≤ 30 urad | ≤ 30 urad | ≤ 30 urad |
Kisaran Suhu Operasi | 25 ℃ ± 10 ℃ | 25 ℃ ± 10 ℃ | 25 ℃ ± 10 ℃ |
Panganteur Sinyal | Analog: ± 10V Digital: protokol XY2-100 | Analog: ± 10V Digital: protokol XY2-100 | Analog: ± 10V Digital: protokol XY2-100 |
Sarat Daya Input (DC) | ± 15V @ 4A Max RMS | ± 15V @ 4A Max RMS | ± 15V @ 4A Max RMS |
355nm F-Theta Lénsa
Bagian Pedaran | Panjang fokus (mm) | Lapang Scan (mm) | Max lawang Murid (mm) | Jarak Gawé (mm) | Pamasangan Benang |
SL-355-360-580 | 580 | 360x360 | 16 | 660 | M85x1 |
SL-355-520-750 | 750 | 520x520 | 10 | 824.4 | M85x1 |
SL-355-610-840-(15CA) | 840 | 610x610 | 15 | 910 | M85x1 |
SL-355-800-1090-(18CA) | 1090 | 800x800 | 18 | 1193 | M85x1 |
355nm Beam Expander
Bagian Pedaran | Ékspansi Babandingan | Input CA (mm) | Kaluaran CA (mm) | Parumahan Diaméterna (mm) | Parumahan Panjangna (mm) | Pamasangan Benang |
BE3-355-D30:84.5-3x-A(M30*1-M43*0.5) | 3X | 10 | 33 | 46 | 84.5 | M30 * 1-M43 * 0,5 |
BE3-355-D33:84.5-5x-A(M30*1-M43*0.5) | 5X | 10 | 33 | 46 | 84.5 | M30 * 1-M43 * 0,5 |
BE3-355-D33:80.3-7x-A(M30*1-M43*0.5) | 7X | 10 | 33 | 46 | 80.3 | M30 * 1-M43 * 0,5 |
BE3-355-D30:90-8x-A(M30*1-M43*0.5) | 8X | 10 | 33 | 46 | 90.0 | M30 * 1-M43 * 0,5 |
BE3-355-D30:72-10x-A(M30*1-M43*0.5) | 10X | 10 | 33 | 46 | 72.0 | M30 * 1-M43 * 0,5 |
355nm Eunteung
Bagian Pedaran | Diaméterna (mm) | Ketebalan (mm) | Palapis |
355 Eunteung | 30 | 3 | HR@355nm, 45 ° AOI |
355 Eunteung | 20 | 5 | HR@355nm, 45 ° AOI |
355 Eunteung | 30 | 5 | HR@355nm, 45 ° AOI |